Performance Assessment of InSb/Al2O3 Channel/Oxide-based Cylindrical Gate-All-Around FET Using Silvaco TCAD

Authors

  • Mst. Rehena Begum
  • Md. Rashique Hamjah Chowdhury
  • Md. Hojaifa Daiyan Chowdhury
  • Muhammad Johirul Islam
  • Iqbal Bahar Chowdhury

DOI:

https://doi.org/10.46610/JOVDSP.2025.v11i03.001

Keywords:

Al₂O₃, CGAA FET, DIBL, InSb, On-off ratio, Silvaco Atlas, Subthreshold swing, TCAD

Abstract

This work presents a Silvaco TCAD-based investigation of an ultra-scaled (channel length of 20 nm) cylindrical gate-all-around FET (CGAA FET), wherein a high-mobility InSb semiconductor and a high-k Al2O3 dielectric are used as the channel and oxide materials, respectively. The CGAA structure provides excellent gate control, thereby suppressing undesirable short-channel effects. On the other hand, high-mobility channels and high-k oxide materials increase drive current, thereby improving performance metrics. The structure parameters and material properties were defined as per quantum-scale considerations. Owing to the scaled channel length, the structure faces quantum confinement of carriers near the oxide/semiconductor interface. Therefore, Schrodinger-Poisson self-consistent models and non-equilibrium green’s function (NEGF) transport models have been employed in the modeling to account for this quantum confinement. The TCAD simulation runs of the proposed CGAA FET result in transfer characteristic curves, from which key performance metrics such as on current (ION), off current (IOFF), on/off ratio (OOR), subthreshold swing (SS), threshold voltage (VTh), and drain-induced barrier lowering (DIBL) under different drain biases (VDS = 0.1 V and 1.0 V) have been extracted. The results demonstrate that stronger electrostatic control has been achieved by the CGAA geometry and also highlight the potential of InSb and Al2O3 as prospective channel and oxide materials for nanoscale FETs.

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Published

2025-12-11

How to Cite

Mst. Rehena Begum, Md. Rashique Hamjah Chowdhury, Md. Hojaifa Daiyan Chowdhury, Muhammad Johirul Islam, & Iqbal Bahar Chowdhury. (2025). Performance Assessment of InSb/Al2O3 Channel/Oxide-based Cylindrical Gate-All-Around FET Using Silvaco TCAD. Journal of VLSI Design and Signal Processing, 11(3), 1–11. https://doi.org/10.46610/JOVDSP.2025.v11i03.001

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